JPS60200963A - 薄膜形成装置 - Google Patents

薄膜形成装置

Info

Publication number
JPS60200963A
JPS60200963A JP5426084A JP5426084A JPS60200963A JP S60200963 A JPS60200963 A JP S60200963A JP 5426084 A JP5426084 A JP 5426084A JP 5426084 A JP5426084 A JP 5426084A JP S60200963 A JPS60200963 A JP S60200963A
Authority
JP
Japan
Prior art keywords
substrate holder
substrate
thin film
uniform
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5426084A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0565586B2 (en]
Inventor
Toshiyuki Koshimo
敏之 小下
Eiji Matsuzaki
永二 松崎
Akihiro Kagimochi
鈎持　秋広
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5426084A priority Critical patent/JPS60200963A/ja
Publication of JPS60200963A publication Critical patent/JPS60200963A/ja
Publication of JPH0565586B2 publication Critical patent/JPH0565586B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP5426084A 1984-03-23 1984-03-23 薄膜形成装置 Granted JPS60200963A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5426084A JPS60200963A (ja) 1984-03-23 1984-03-23 薄膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5426084A JPS60200963A (ja) 1984-03-23 1984-03-23 薄膜形成装置

Publications (2)

Publication Number Publication Date
JPS60200963A true JPS60200963A (ja) 1985-10-11
JPH0565586B2 JPH0565586B2 (en]) 1993-09-20

Family

ID=12965589

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5426084A Granted JPS60200963A (ja) 1984-03-23 1984-03-23 薄膜形成装置

Country Status (1)

Country Link
JP (1) JPS60200963A (en])

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010287573A (ja) * 2009-06-11 2010-12-24 Semes Co Ltd 基板加熱ユニット及びこれを含む基板処理装置
WO2015030167A1 (ja) * 2013-08-29 2015-03-05 株式会社ブリヂストン サセプタ
JP2015046536A (ja) * 2013-08-29 2015-03-12 株式会社ブリヂストン サセプタ
JP2016046464A (ja) * 2014-08-26 2016-04-04 株式会社ブリヂストン サセプタ
JP2016046463A (ja) * 2014-08-26 2016-04-04 株式会社ブリヂストン サセプタ

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5582771A (en) * 1978-12-20 1980-06-21 Toshiba Corp Ion implanting device
JPS5784738U (en]) * 1980-11-13 1982-05-25
JPS5797616A (en) * 1980-12-10 1982-06-17 Anelva Corp Base plate for vacuum equipment
JPS5818671A (ja) * 1981-07-27 1983-02-03 Fuji Electric Co Ltd 真空蒸着方法
JPS5895634U (ja) * 1981-12-22 1983-06-29 松下電器産業株式会社 アニ−ル装置
JPS58185766A (ja) * 1982-04-21 1983-10-29 Jeol Ltd 膜作成方法
JPS58197719A (ja) * 1982-05-13 1983-11-17 Ricoh Co Ltd 基板の加熱構造および加熱方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5582771A (en) * 1978-12-20 1980-06-21 Toshiba Corp Ion implanting device
JPS5784738U (en]) * 1980-11-13 1982-05-25
JPS5797616A (en) * 1980-12-10 1982-06-17 Anelva Corp Base plate for vacuum equipment
JPS5818671A (ja) * 1981-07-27 1983-02-03 Fuji Electric Co Ltd 真空蒸着方法
JPS5895634U (ja) * 1981-12-22 1983-06-29 松下電器産業株式会社 アニ−ル装置
JPS58185766A (ja) * 1982-04-21 1983-10-29 Jeol Ltd 膜作成方法
JPS58197719A (ja) * 1982-05-13 1983-11-17 Ricoh Co Ltd 基板の加熱構造および加熱方法

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010287573A (ja) * 2009-06-11 2010-12-24 Semes Co Ltd 基板加熱ユニット及びこれを含む基板処理装置
US8461490B2 (en) 2009-06-11 2013-06-11 Semes Co., Ltd. Substrate heating unit and substrate treating apparatus including the same
WO2015030167A1 (ja) * 2013-08-29 2015-03-05 株式会社ブリヂストン サセプタ
JP2015046536A (ja) * 2013-08-29 2015-03-12 株式会社ブリヂストン サセプタ
CN105493260A (zh) * 2013-08-29 2016-04-13 株式会社普利司通 承载器
US10287685B2 (en) 2013-08-29 2019-05-14 Maruwa Co., Ltd. Susceptor
JP2016046464A (ja) * 2014-08-26 2016-04-04 株式会社ブリヂストン サセプタ
JP2016046463A (ja) * 2014-08-26 2016-04-04 株式会社ブリヂストン サセプタ

Also Published As

Publication number Publication date
JPH0565586B2 (en]) 1993-09-20

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